Anua Birch Moisture Mask is a hydrating face mask that contains birch sap from Gangwon-do, South Korea. The mask is designed to provide intense hydration and maintain the skin’s vitality with the help of abundant amounts of vitamins A and C and minerals. Another key ingredient is Aquaxyl™, a patented substance that helps prevent moisture loss from the skin. It also contains 10 different types of hyaluronic acid that work to maintain the skin’s hydration levels.
Benefits:
-
Intensive hydration: Contains birch sap and 10 different types of hyaluronic acid that, together, provide deep and long-lasting hydration to the skin.
-
Nutritious: Rich in vitamins A and C and essential minerals that help maintain the skin's vitality and freshness.
-
Safe and Gentle: Rated safe according to EWG's Green Grade and tested for skin irritation, making it suitable for sensitive skin.
Use:
-
Cleansing: Start by thoroughly cleaning your face to remove dirt and makeup.
-
Tone: Apply a toner to prepare your skin and optimize the absorption of the mask ingredients.
-
Application: Open the package and place the mask evenly over the face, taking care to avoid direct contact with the eyes and lips.
-
Relaxation: Leave the mask on your skin for 15-20 minutes. This gives your skin enough time to absorb the essence.
-
Removal and aftercare: Gently peel the mask off your face. Pat your skin gently with your fingertips to help absorb any remaining essence.
INGREDIENTS
Water, Dipropylene Glycol, Butylene Glycol, Glycerin, Diglycerin, Betula Platyphylla Japonica Juice, Beta-Glucan, Sodium Hyaluronate, Hydroxypropyltrimonium Hyaluronate, Sodium Acetylated Hyaluronate, Hydrolyzed Hyaluronic Acid, Hyaluronic Acid, Sodium Hyaluronate Crosspolymer, Hydrolyzed Sodium Hyaluronate, Potassium Hyaluronate, Dipotassium Glycyrrhizate, Trehalose, Allantoin, Butyrospermum Parkii (Shea) Butter, Phytosphingosine, Ceramide NP, Glucose, Xylitol, 1,2-Hexanediol, Sodium Phytate.
EUR
USD
